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Key features

Smart Print UV is a maskless lithography equipment, based on a DMD projection technology, compatible with a wide range of resists and substrates.

Smart Print UV can produce any 2D shapes at micron resolution without the need for a hard mask.

Smart Print UV is perfectly designed for any application fields requiring surface micro patterning such as microfluidics, biotechnologies and microelectronics.

Time & money
saving

Test and adjust your pattern quickly.
No need for a hard mask, lithograph directly your sample in a few seconds.

Adjustable writing
field and resolution

Our projection to objective technology gives user access to four different writing resolution to combine writing precision and speed.
With our "quick release" system, the resolution can be changed in just a couple of seconds without any calibration step.

Align your design
on your patterns

The feedback camera coupled with the secondary 590 nm light source allows direct overlay of the design on top of the sample, making the alignment steps very intuitive for the user.

A wide range of substrates,
up to 5” square

Our objective range has been carefully selected with a long working distance (up to 3 cm) to make Smart Print UV a contactless technology and thus compatible with non-standard substrates (non-flat, flexible, thick).

Down to 1.5 micron-wide features

Adapt the writing resolution to your design. Use a wide field of view to pattern quickly with 1x objective, and achieve down to 1.5µm minimal feature size using the 10x objective.

Tabletop with
small footprint

Benefit from Smart Print UV high compacity.
Dimensions : W: 52cm, D: 52cm, H: 69cm.
It can adapt to clean room environments and is self-standing with no external equipment required.

Specifications
Materials
Software
Technology
System Standard Advanced
Light source Exposure : 385nm; alignment : 590nm
Minimum feature size 1.5µm
Stitching precision 2µm <1µm
Alignment accuracy (for 1cm² printed area) 2µm 1µm
Maximum exposure area 70 x 70 mm² 118 x 118 mm²
Substrate size Up to 4″ Up to 5″
Writing speed (6µm resolution) 77 mm²/min 220 mm²/min
System dimensions W:52cm, D:52cm, H:69cm

 

 

Objectives 1x 2.5x 5x 10x
Writing fields (mm) 10.56 x 5.94 4.2 x 2.4 2.1 x 1.2 1.06 x 0.59
Smallest features (µm) 15 6 3 1.5

 

 

Options and accessories

  • Multiple sample holder (glass-slide, 4″ wafer…)

Testimonials

We use the Smart Print for the fabrication of all our next-generation solar cell prototypes, which are based on III-V and 2D materials. Having the Smart Print has changed the way we work. We have total flexibility to adapt the lithography design to the demands of each particular device or process. It offers us the flexibility of e-beam lithography, but in a cost-effective, easy to use photolithography system.

Elisa Antolin

Instituto de Energia Solar - Universidad Politecnica de Madrid - Spain

We use the Smart Print for the fabrication of all our next-generation solar cell prototypes, which are based on III-V and 2D materials. Having the Smart Print has changed the way we work. We have total flexibility to adapt the lithography design to the demands of each particular device or process. It offers us the flexibility of e-beam lithography, but in a cost-effective, easy to use photolithography system.

Elisa Antolin

Instituto de Energia Solar - Universidad Politecnica de Madrid - Spain